| Record no |
2013042289591 |
| Activity status |
Active |
| Working Title |
CROSS LINKABLE POLYMERS BY PHOTO & ELECTRON BEAM RADIATION |
| Working Inventors |
M G KULKARNI; |
| Contributing institutions |
NCL |
| Administered by |
CSIR |
| Ownership |
|
| Categories > Subjects |
Polymer sciences and engineering |
| Categories > Portfolio |
Polymers for speciality applications |
| Disclosure number |
2011-INV-0057 |
| NCL No |
2011-NCL-0049 |
| CSIR No |
2011-NF-0199
|
| Priority date |
12-05-2011 |
| Country |
WO |
| Application number |
PCT/IN2012/000792 |
| Provisional filing date |
|
| Complete filing date |
12-06-2012 |
| Publication status |
Yes |
| Publication date |
06-13-2013 |
| Publication no |
WO2013084247 |
| Granted number |
|
| Granted date |
|
| Final title |
RESIST FOR ELECTRON BEAM AND OPTICAL LITHOGRAPHY |
| Final Inventors |
MG KULKARNI;DADASAHEB VITTHAL SANGAVE; |
| Abstract |
The present invention describes a first generation dendrimers useful in lithography comprising 135trisbromomethylbenzene as the core and dense bulky rigid units selected from trisphenol 1 1 1trisp4hydroxyphenyl ethane bisphenolA and 15dihydroxy naphthalen |
| Case status |
Complete specification filed |
| Licensing status |
|
| Licensing case no |
|
| Client name |
|
| Lead inventors |
MOHAN GOPALKRISHNA KULKARNI |
| Categories > Industry > Primary |
Polymers and Specialty and Others |
| Categories > Industry > other |
|