| Record no |
2014082847414 |
| Activity status |
Dead or Administration by others |
| Working Title |
CROSS LINKABLE POLYMERS BY PHOTO & ELECTRON BEAM RADIATION |
| Working Inventors |
M G KULKARNI;DADASAHEB VITTHAL SANGAVE; |
| Contributing institutions |
NCL |
| Administered by |
CSIR |
| Ownership |
|
| Categories > Subjects |
Polymer sciences and engineering |
| Categories > Portfolio |
Polymers for speciality applications |
| Disclosure number |
2011-INV-0057 |
| NCL No |
2011-NCL-0049 |
| CSIR No |
2011-NF-0199
|
| Priority date |
12-05-2011 |
| Country |
US |
| Application number |
14/363240 |
| Provisional filing date |
|
| Complete filing date |
06-05-2014 |
| Publication status |
Yes |
| Publication date |
11-06-2014 |
| Publication no |
2014330031 (A1) |
| Granted number |
|
| Granted date |
|
| Final title |
RESIST FOR ELECTRON BEAM AND OPTICAL LITHOGRAPHY |
| Final Inventors |
MG KULKARNI;DADASAHEB VITTHAL SANGAVE; |
| Abstract |
The_present_invention_describes_a_first_generation_dendrimers_useful_in_lithography_comprising_135trisbromomethylbenzene_as_the_core_and_dense_bulky_rigid_units_selected_from_trisphenol_1_1_1trisp4hydroxyphenyl_ethane_bisphenolA_and_15dihydroxy_naphthalen |
| Case status |
Abandoned after filing |
| Licensing status |
|
| Licensing case no |
|
| Client name |
|
| Lead inventors |
MOHAN GOPALKRISHNA KULKARNI |
| Categories > Industry > Primary |
Polymers and Specialty and Others |
| Categories > Industry > other |
|